We offer grown-in-USA optical grade silicon blanks for infrared windows and lenses. "Blanks" are semi-fabricated shapes to customer specified dimensions without final grinding and polishing. These products are exported.
Grades: Boston Electronics Corporation supplies silicon for optical use in Transmissive Grade and Mirror Grade. Transmissive grade is guaranteed to have very good transmission in the 1.2 to 6.7Ám range. Mirror grade is not warranted with respect to transmission and is thus suitable primarily for mirror substrates.
Transmittance: We have unique measured data on the transmittance of polished, uncoated silicon in the 3 to 50 micron spectral region. This data was aquired on Czochralski-grown silicon and on Float Zone silicon. The Cz silicon was 0.130 inches (3.3 mm) thick and had resistivity > 10 ohm-cm. The FZ material was in 3 thicknesses, 0.089, 0.209 and 0.403 inches (2.26, 5.3 and 10.3 mm) and had resistivity > 500 ohm-cm. What is shows is: fine internal transmittance (transmittance neglecting Fresnel reflection losses) out to 1300 cm-1 (6.7 microns) in any thickness or resistivity; fine transmittance for 2.3 mm FZ material for wavlengths longer than 400 cm-1 (25 microns ); and FZ material transmittance in between (1300 to 200 cm-1, or 6.7 to 25 microns) that would be acceptable for many purposes IF the thickness of the piece is in the range of 0.5 mm AND so long as the strong absorption 610 - 600 cm-1 is not a killer in the particular application. For a copy of this data in pdf format, click here.
Crystallinity: All silicon offered by Boston Electronics Corporation will be monocrystalline and randomly oriented unless otherwise specified
Forms of Supply: Optical grade silicon from Boston Electronics Corporation is available in the form of boules or cylinders and as semi-fabricated blanks.
Sizes: Available from about 5 to 400 mm (0.2 to 16 inch) diameter.
Silicon MSDS: click here for silicon material safety data sheet.
Also we offer silicon electrodes and rings for oxide plasma etchers, and silicon for sputtering targets for electronics production. We have standard silicon electrodes for etchers made by TEL (Tokyo Electron Ltd.). These electrodes are typically used in the oxide etch process. We are not experts in the etch process but we have a large business in electrodes and sputtering targets "built-to-print". Please contact us with details of your requirements.
(We also offer pyrolytic graphite electrodes for Anelva etchers).
Drawings of a few standard electrodes are available by fax on request.
Questions? Comments? Suggestions? Send email to the Webmaster at Boston Electronics.